Qualification of NexION 5000 ICP-MS for metal trace analysis
Innanen, Emilia (2022)
2022
All rights reserved. This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.
Julkaisun pysyvä osoite on
https://urn.fi/URN:NBN:fi:amk-2022120125420
https://urn.fi/URN:NBN:fi:amk-2022120125420
Tiivistelmä
This thesis project was carried out for Pibond Oy, a company that specializes in manufacturing polymers and monomers for the needs of the electronics industry. The purpose of the project was to qualify Perkin Elmer NexION 5000 ICP-MS for analysis of metals in different sample matrices. NexION 5000 is set to replace the previous instrument Perkin Elmer Elan DRC II ICP-MS as a part of quality control procedure.
In semiconductor industry inductively coupled plasma mass spectrometer (ICP-MS) is the preferred method for metal trace analysis, as it is capable of detecting very low concentrations while maintaining a relatively wide range of linearity. Other advantages of ICP-MS are the speed of the analysis and the possibility to analyse multiple analytes simultaneously.
Qualification was done as a part of the validation process of the new equipment where the goal was to ensure that the new equipment is fit for its purpose. Qualifications were carried out by analyzing the following parameters: detection limit, method detection limit, linearity, repeatability, accuracy, and range. Qualification was performed for all 28 metals that are routinely measured in quality control processes. The criteria for the results was to reach at least the same level of performance parameters as the old instrument, for it to be approved for routine use.
Most linearity plots achieved the coefficient correlation value of 0.995 or above in the range of 0-100 ppb. Only molybdenum received a marginally lower result of 0.9949. Accuracy precision all metals received mean recovery values within the acceptable range of 75–125 %. In range measurements the accuracy was observed to hinder after the concentration of 1000 ppb and above for many elements. Relative standard deviations of repeatability measurements were under 8% for all elements. Overall, the qualification results were satisfactory and the instrument can therefore be deemed fit for metal trace analysis.
In semiconductor industry inductively coupled plasma mass spectrometer (ICP-MS) is the preferred method for metal trace analysis, as it is capable of detecting very low concentrations while maintaining a relatively wide range of linearity. Other advantages of ICP-MS are the speed of the analysis and the possibility to analyse multiple analytes simultaneously.
Qualification was done as a part of the validation process of the new equipment where the goal was to ensure that the new equipment is fit for its purpose. Qualifications were carried out by analyzing the following parameters: detection limit, method detection limit, linearity, repeatability, accuracy, and range. Qualification was performed for all 28 metals that are routinely measured in quality control processes. The criteria for the results was to reach at least the same level of performance parameters as the old instrument, for it to be approved for routine use.
Most linearity plots achieved the coefficient correlation value of 0.995 or above in the range of 0-100 ppb. Only molybdenum received a marginally lower result of 0.9949. Accuracy precision all metals received mean recovery values within the acceptable range of 75–125 %. In range measurements the accuracy was observed to hinder after the concentration of 1000 ppb and above for many elements. Relative standard deviations of repeatability measurements were under 8% for all elements. Overall, the qualification results were satisfactory and the instrument can therefore be deemed fit for metal trace analysis.